Granted Patent

Highly Senstive Mapdsm-mapdst Based Resist Technology For Next Generation Lithography Applications

Application Number
201611022219
Patent Number
383670
Application Date
29-Jun-2016
Grant Date
12-Mar-2021

List of Inventors

Dr. Satyendra Pal, Dr. Kenneth E. Gonsalves, Dr. Subrata Ghosh, Dr. C.p. Pradeep, Mr. Guruprasad Reddy, Dr. Satinder K. Sharma, Dr. Pawan Kumar

Patent Documents

Patent Document
PDF Document
Invention_Summary_202021031349.pdf Open PDF
Representative Drawing
Patent Drawing
Representative Drawing
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